amsbio supplies gold-coated glass slides / mica / silicon wafers / coverslips
- Our gold-coated substrates offer enable you to:
- Avoid paying clean room access fees
- Avoid contamination problems from multi-user evaporators
- Avoid reproducibility problems
- Features Include:
- Plasma-cleaned surfaces
- Electron-beam deposited metal films
- Titanium adhesion layer
- Prepared in a dedicated clean environment
- Availability of ellipsometric constants
Gold Substrates Download   
New Stripped Gold Chips   
View All Available Substrates
|
Code & Pricing |
Product Description |
Qty |
AU.0100.ALSI |
Aluminosilicate Glass Slides Coated with 100 A Au 1' x 3' x 0.7mm 100 A Au over 20 A Ti Adhesion Layer |
5 |
AU.0500.ALSI |
Aluminosilicate Glass Slides Coated with 500 A Au 1' x 3' x 0.7mm 500 A Au over 25 A Ti Adhesion Layer |
5 |
AU.1000.ALSI |
Aluminosilicate Glass Slides Coated with 1000 A Au 1' x 3' x 0.7mm 1000 A Au over 50 A Ti Adhesion Layer |
5 |
AU.0100.CSS |
Coverslips Coated with 100 A Au 22mm square, 0.13 to 0.16mm thickness 100 A Au over Titanium adhesion layer |
12 |
AU.0500.CSS |
Coverslips Coated with 500 A Au 22mm square, 0.13 to 0.16mm thickness 500 A Au over Titanium adhesion layer |
12 |
AU.0100.CSR |
Coverslips Coated with 100 A Au 15mm round, 0.13 to 0.16mm thickness 100 A Au over Titanium adhesion layer |
24 |
AU.2000.MC1 |
Mica Coated with 2000 A Au (small) 1' x 1.5' mica |
1 |
AU.2000.MC2 |
Mica Coated with 2000 A Au (large) 1' x 3' mica |
1 |
AU.1000.SL1 |
Silicon Wafers Coated with 1000 A Au 4' diameter, 525um thickness 1000 A Au over 50A Ti adhesion layer |
3 |
AU.1000.SL2 |
Silicon Wafers Coated with 1000 A Au 4' diameter, 525um thickness 1000 A Au over 50A Ti adhesion layer |
12 |
AU.2000.MTSG |
Template Stripped Gold Chips - Mica 1cm x 1cm glass chips adhered to a 2000 A gold-coated piece of mica |
5 |
AU.1000.SWTSG |
Template Stripped Gold Chips - Silicon Wafer 1cm x 1cm glass chips adhered to 1000A gold-coated prime grade silicon wafer |
20 |
Applications:
Cell Culture
Substrates are prepared in an electron beam evaporator that is solely dedicated
to the deposition of gold films. This prevents the occurrence of impurity metals
(e.g., trace levels of Cu) contaminating the gold films, as is the case when
multi-user equipment is used to coat gold substrates
Microarrays
Substrates are prepared in an electron beam evaporator using titanium, not
chromium, as the adhesion layer. This avoids the contamination that can occur
when a thin layer of chromium is used to promote adhesion of the gold film to an
underlying substrate (such as a glass microscope slide), since chromium readily
dissolves and diffuses to the surface of the gold film (and can adversely modify
the reactivity of the gold).
Surface Plasmon Reflectometry
Substrates are deposited using an electron beam evaporator, which permits
precise control of gold deposition rates and thus the surface roughness. This
ensures a high level of control over the thickness and nanometer-scale surface
roughness of gold films, as is necessary in order to generate reproducible
results with surface plasmon reflectometry.
Scanning Probe Microscopy
Substrates deposited on mica can be thermally annealed or transferred to epoxy
resin (reverse mounting) to form atomically flat surfaces suitable for scanning
probe microscopy.